By Xu Ma,Gonzalo R. Arce
Optical lithography is among the such a lot demanding components of present built-in circuit production expertise. The semiconductor is depending extra on solution enhancement suggestions (RETs), considering the fact that their implementation doesn't require major adjustments in fabrication infrastructure. Computational Lithography is the 1st publication to deal with the computational optimization of RETs in optical lithography, offering an in-depth dialogue of optimum optical proximity correction (OPC), section moving masks (PSM), and off-axis illumination (OAI) RET instruments that use model-based mathematical optimization approaches.
The publication begins with an advent to optical lithography structures, electrical magnetic box ideas, and the basics of optimization from a mathematical viewpoint. It is going directly to describe intimately forms of optimization algorithms to enforce RETs. lots of the algorithms constructed are according to the applying of the OPC, PSM, and OAI techniques and their combos. Algorithms for coherent illumination in addition to in part coherent illumination platforms are defined, and various simulations are provided to demonstrate the effectiveness of the algorithms. additionally, mathematical derivations of all optimization frameworks are presented.
The accompanying MATLAB® software program records for all of the RET tools defined within the e-book make it effortless for readers to run and examine the codes with the intention to comprehend and observe the optimization algorithms, in addition to to layout a suite of optimum lithography mask. The codes can also be utilized by readers for his or her examine and improvement actions of their educational or business firms. An accompanying MATLAB® software program consultant can also be incorporated. An accompanying MATLAB® software program consultant is incorporated, and readers can obtain the software program to exploit with the advisor at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography.
Tailored for either entry-level and skilled readers, Computational Lithography is intended for college, graduate scholars, and researchers, in addition to scientists and engineers in business organisations whose learn or occupation box is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography attracts from the wealthy conception of inverse difficulties, optics, optimization, and computational imaging; as such, the publication can be directed to researchers and practitioners in those fields.
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Computational Lithography (Wiley Series in Pure and Applied Optics) by Xu Ma,Gonzalo R. Arce